There are three main processes for manufacturing TFT-LCD:
1)Array Processing
2)Organization process
3)Modular process
Finally, we see the product.
1.Array Processing
1) A piece of glass with smooth surface and no impurities is the main raw material for manufacturing TFT glass substrates. Before making it, the glass should be washed clean with special cleaning solution, then dehydrated and dried.
2) In order to deposit metal film on glass substrates, metal materials should be placed in vacuum chamber first. After plasma is produced by special gases on the metal, atoms on the metal will be bumped into the glass, and then a layer of metal film will be formed.
3) After plating the metal film, we also need to coat a layer of non-conductive layer and semi-conductive layer. In the vacuum chamber, we first heat the glass plate, then spray the special gas by the high-voltage electric sprayer to make the electrons and gases produce plasma. After chemical reaction, the non-conductive layer and the semiconductor layer are formed on the glass.
4) After the film is formed, we need to make transistor patterns on the glass. First of all, we need to spray a highly sensitive photoresistive liquid into the Yellow room, then cover it with a light mask to irradiate the blue and purple light for exposure, and finally send it to the development area to spray the developer, so as to remove the light resistance after illumination, but also to make the photoresistive layer stereotyped.
5) After the photoresist is set, we can use etching for wet etching, exposing the useless film, or dry etching with the chemical reaction of plasma. After etching, we can remove the remaining photoresist with slip, and finally produce the circuit pattern needed by the transistor.
6) To form available thin film transistors, it is necessary to repeat the processes of cleaning, coating, photoresistance, exposure, development, etching and photoresistance removal. Generally speaking, to manufacture TFT-LCD, it is necessary to repeat 5 to 7 times.
